Title :
Monte Carlo simulations of the transport of sputtered particles
Author :
Macek, Karel ; Macek, P. ; Helmersson, Ulf
Author_Institution :
Dept. of Phys. & Meas. Technol., Linkoping Univ., Sweden
Abstract :
A model for Monte Carlo calculation of the transport of sputtered particles is presented which allows to estimate the density of sputtered material in the gas phase of a low pressure DC magnetron discharge. Simulation of DC magnetron sputtering of Cu in 0.1 Pa of Ar using an average target power density 2 W/cm2 shows that Cu concentration is below 1% in most of the discharge volume. The influence of the process parameters on the relative Cu density is discussed
Keywords :
Monte Carlo methods; copper; metallic thin films; sputter deposition; Cu; DC magnetron sputtering; Monte Carlo simulation; copper thin film deposition; gas discharge; particle transport; Argon; Geometry; Magnetic flux; Magnetic materials; Magnetosphere; Monte Carlo methods; Particle scattering; Solid modeling; Sputtering; Substrates;
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 1998. ASDAM '98. Second International Conference on
Conference_Location :
Smolenice Castle
Print_ISBN :
0-7803-4909-1
DOI :
10.1109/ASDAM.1998.730167
