DocumentCode
2340935
Title
11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003
fYear
2003
fDate
23-26 Sept. 2003
Abstract
The following topics were dealt: rapid thermal processing; melting point; semiconductor industry; CMOS; traceability of RTP temperature measurements; measurements and calibration methods; industry wide emissivity standards initiative; advanced technologies.
Keywords
CMOS integrated circuits; batch processing (industrial); computational fluid dynamics; emissivity; ion implantation; isolation technology; laser beam annealing; melting point; rapid thermal processing; reflectivity; CMOS; RTP temperature measurements traceability; advanced technologies; advanced thermal processing; calibration methods; industry wide emissivity standards; melting point; rapid thermal processing; semiconductor industry; CMOS integrated circuits; Ion implantation; Isolation technology; Laser annealing; Optical reflection; Rapid thermal processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on
Conference_Location
Charleston, SC, USA
Print_ISBN
0-7803-7874-1
Type
conf
DOI
10.1109/RTP.2003.1249116
Filename
1249116
Link To Document