Title :
Overview of NIST metrology development for the semiconductor industry
Author_Institution :
Office of Microelectron. Programs, Nat. Inst. of Stand. & Technol., USA
Abstract :
The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension metrology, gate dielectric characterization, interconnect materials evaluation, wafer surface inspection, mass flow controller calibration, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.
Keywords :
dielectric measurement; inspection; integrated circuit interconnections; integrated circuit packaging; project engineering; reviews; scanning electron microscopes; ultraviolet lithography; NIST metrology development; National Institute of Standards and Technology; critical dimension metrology; gate dielectric properties; interconnect materials evaluation; lithography; manufacturing support; mass flow controller calibration; project selection; semiconductor industry; specific projects addressing; wafer surface inspection; Calibration; Dielectric materials; Electronics industry; Inspection; Lithography; Manufacturing industries; Metrology; NIST; Semiconductor materials; Weight control;
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on
Print_ISBN :
0-7803-7874-1
DOI :
10.1109/RTP.2003.1249121
