Title :
Manganese-based magnetic compounds grown on III-V semiconductors: growth technique, magnetic properties, and applications
Author :
Akinaga, H. ; Miyanishi, S. ; Asamitsu, A. ; Van Roy, W. ; Kuo, L.H. ; Tomioka, Y. ; Boeck, J. De ; Borghs, G.
Author_Institution :
Joint Res. Center for Atom Technol., Nat. Inst. for Adv. Interdisciplinary Res., Ibaraki, Japan
Abstract :
In this paper we firstly discuss briefly developments in the field of ferromagnetic/semiconductor hybrid devices. We will emphasize the potential of the use of epitaxial technique to tailor the magnetic properties and to improve potential device characteristics. We will describe further the advantage of Molecular Beam Epitaxy (MBE) to produce excellent heterostructure interfaces between ferromagnetic and semiconductor layers. As a prime example of how magnetic properties can be controlled by MBE we describe our recent results on the epitaxy of ferromagnetic Mn2Sb on GaAs. We show the substrate temperature dependence of the crystallographic and magnetic properties of (001) Mn2Sb films grown on (001) GaAs substrates. The Mn 2Sb epitaxial film grown at 150°C shows high quality and single crystallinity of the film with an automatically flat Mn2 Sb/GaAs heterointerface. The small coercive field and the large magneto-optical Kerr effect are very promising for ferromagnetic/semiconductor hybrid devices. The correlation between the crystallographic and magnetic properties is discussed
Keywords :
III-V semiconductors; Kerr magneto-optical effect; coercive force; ferrimagnetic materials; gallium arsenide; magnetic epitaxial layers; manganese compounds; molecular beam epitaxial growth; 150 degC; III-V semiconductors; Mn2Sb-GaAs; coercive field; epitaxial film; ferrimagnetic/semiconductor hybrid devices; heterostructure interfaces; magneto-optical Kerr effect; molecular beam epitaxy; substrate temperature dependence; Crystallography; Gallium arsenide; III-V semiconductor materials; Magnetic films; Magnetic properties; Magnetic semiconductors; Magnetosphere; Molecular beam epitaxial growth; Semiconductor films; Substrates;
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 1998. ASDAM '98. Second International Conference on
Conference_Location :
Smolenice Castle
Print_ISBN :
0-7803-4909-1
DOI :
10.1109/ASDAM.1998.730186