Title :
On aspects of radiation damage in Tokamak diagnostics
Author :
DelMedico, S. ; Barnouin, O. ; Petra, M. ; Miley, G.H.
Author_Institution :
Rockford Technol. Associates, Champaign, IL, USA
Abstract :
Summary form only given. The harsh radiation environment presented by the D-T burning plasma in next-step tokamak fusion devises can cause severe damage to critical optical components necessary for research diagnostics and control instrumentation. Using the TRIGA research reactor at the University of Illinois to simulate the radiation environment expected in fusion devices, experimental studies have been performed to examine the feasibility of using combined thermal and optical annealing techniques to maintain the optical quality during irradiation. Using pulsed operation of the reactor, in-situ measurements have been made of the transient optical effects of radiation on bulk fused silica under various continuous annealing conditions. Additional long term effects studies have also been performed under steady-state radiation conditions to examine the effect of accumulated dose and repeated annealing. The purpose of this present research is to develop a practical thermal/optical annealing program to reduce the level of radiation induced color center damage in optical components intended for next step tokamak diagnostics.
Keywords :
annealing; deuterium; fusion reactor fuel; fusion reactor ignition; fusion reactor instrumentation; fusion reactors; plasma diagnostics; plasma toroidal confinement; radiation effects; tritium; D-T; D-T burning plasma; TRIGA research reactor; Tokamak diagnostics; University of Illinois; accumulated dose; bulk fused silica; colour centre damage; control instrumentation; critical optical components; harsh radiation environment; in-situ measurements; long term effects; next-step tokamak fusion devises; optical annealing; optical components; optical quality; pulsed operation; radiation damage; radiation environment; repeated annealing; research diagnostics; steady-state radiation conditions; thermal annealing; transient optical effects; Annealing; Inductors; Instruments; Optical control; Optical devices; Plasma devices; Plasma diagnostics; Plasma simulation; Pulse measurements; Tokamaks;
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
Print_ISBN :
0-7803-2669-5
DOI :
10.1109/PLASMA.1995.532798