DocumentCode :
2341248
Title :
Room temperature hemispherical and bi-directional reflectances
Author :
Early, Edward A.
Author_Institution :
NIST, Gaithersburg, MD, USA
fYear :
2003
fDate :
23-26 Sept. 2003
Firstpage :
133
Lastpage :
136
Abstract :
The emissivity of a material is conveniently determined from its reflectance, which is turn can be used to validate optical models for estimating emissivity at high temperatures. The Optical Technology Division of the National Institute of Standards and Technology maintains the national reference instruments for measurements of reflectance. Within the Division, the Spectrophotometry project is responsible for reflectance measurements at wavelengths from 250 nm to 2500 nm on non-fluorescent materials at room temperature. The reflecting properties of a material can be categorized as either specular (mirror-like) or diffuse. In addition, the reflectance depends upon the geometry of the measurement. In general, the reflectance of a specular material is measured using a bi-directional geometry (incident and reflected radiant flux at fixed directions) while a diffuse material is measured using a directional-hemispherical geometry (incident or reflected radiant flux at a fixed direction, the other flux at all directions). The Spectrophotometry project has reference and commercial instruments for measurements at both geometries, with uncertainties (k=2) in reflectance of approximately 0.2% for specular materials and 0.4% for diffuse materials.
Keywords :
emissivity; geometrical optics; goniometers; measurement standards; reflectivity; reflectometry; spectrophotometry; 250 to 2500 nm; 293 to 298 K; National Institute of Standards and Technology; Optical Technology Division; bidirectional reflectances; diffuse materials; emissivity; hemispherical reflectances measurement; incident radiant flux; mirror-like reflectance; nonfluorescent materials; optical models; reflected radiant flux; reflecting properties; room temperature; spectrophotometry; uncertainty reflectance; Bidirectional control; Geometrical optics; Geometry; Instruments; NIST; Optical materials; Reflectivity; Temperature measurement; Terminology; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on
Print_ISBN :
0-7803-7874-1
Type :
conf
DOI :
10.1109/RTP.2003.1249134
Filename :
1249134
Link To Document :
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