DocumentCode :
2342085
Title :
10th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2002 (Cat. No.02EX574)
fYear :
2002
fDate :
25-27 Sept. 2002
Keywords :
lithography; rapid thermal processing; semiconductor device manufacture; temperature measurement; temperature sensors; RTP control; RTP technology; RTP tool performance; advanced thermal processing; optical lamp-based heating; process engineering; rapid thermal processing; semiconductor manufacture; semiconductor processing; temperature measurement instrumentation; wafer pattern effects; wafer temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2002. RTP 2002. 10th IEEE International Conference of
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-7465-7
Type :
conf
DOI :
10.1109/RTP.2002.1039431
Filename :
1039431
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2342085
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