Title :
Emission microscopy in semiconductor failure
Author :
Inuzuka, Eiji ; Suzuki, Hiroyoshi
Author_Institution :
Hamamatsu Photonics KK, Japan
Abstract :
Emission microscopy is introduced as a new technique for semiconductor failure analysis. Very faint photo-emission is observed where various abnormal condition is arising. To find exact location of the failure site is a key to improve the design and production yield of the device. Emission microscope and it´s application is described with practical analysis results
Keywords :
VLSI; image processing equipment; integrated circuit testing; microchannel plates; optical microscopy; photodetectors; photoemission; photon counting; LSI; VLSI; abnormal condition; emission microscopy; semiconductor failure; semiconductor failure analysis; Cameras; Cathodes; Constitution; Electron emission; Image intensifiers; Large scale integration; Lenses; Optical microscopy; Phosphors; Pulse measurements;
Conference_Titel :
Instrumentation and Measurement Technology Conference, 1994. IMTC/94. Conference Proceedings. 10th Anniversary. Advanced Technologies in I & M., 1994 IEEE
Conference_Location :
Hamamatsu
Print_ISBN :
0-7803-1880-3
DOI :
10.1109/IMTC.1994.352178
