Title :
Advances in long-pulse, high power vacuum BWO operation
Author :
Grabowski, C. ; Gahl, J. ; Schamiloglu, Edl
Author_Institution :
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
Abstract :
Summary form only given, as follows. Long-pulse, high power microwave experiments are continuing at the University of New Mexico (UNM) using a Physics International Pulserad 110A that has been modified for long-pulse operation. The Pulserad 110A originally consisted of an 11-stage Marx bank (having an energy storage capacity of 2.75 kJ) followed by a Blumlein for pulse shaping. The Blumlein has been replaced now with a parallel L-C network, as described by Cummings, and together both the Marx bank and the L-C network form a type-A pulse forming network with an output impedance of 40 /spl Omega/, a pulse duration of 500/spl sim/700 ns, and a peak voltage and current for a matched load of 570 kV and 14.3 kA. Shunt resistors placed at the output have reduced the output current to /spl sim/7.5 kA and increased the output impedance to /spl sim/76 /spl Omega/. The UNM Pulserad 110A drives an electron beam diode having an annular, knife-edge graphite cathode. The electron beam which is emitted from the cathode enters a slow-wave structure (SWS) having 12 periods with varying ripple amplitudes. Beam current and cathode voltage are monitored with self-integrating Rogowski coils and a capacitive voltage divider, respectively.
Keywords :
backward wave oscillators; microwave oscillators; slow wave structures; 14.3 kA; 170 MW; 20 to 25 ns; 40 ohm; 500 to 700 ns; 570 kV; 7.5 kA; 76 ohm; Pulserad 110A; backward wave oscillator; beam current; capacitive voltage divider; cathode voltage; electron beam diode; high power microwave experiments; knife-edge graphite cathode; long-pulse high power vacuum BWO operation; parallel L-C network; ripple amplitudes; self-integrating Rogowski coils; slow-wave structure; type-A pulse forming network; Cathodes; Diodes; Electron beams; Energy storage; Impedance; Monitoring; Physics; Pulse shaping methods; Resistors; Voltage;
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
Print_ISBN :
0-7803-2669-5
DOI :
10.1109/PLASMA.1995.532813