• DocumentCode
    2343342
  • Title

    An accurate preprocessor for Monte Carlo study of electron transport in inversion layers of silicon nMOSFETs

  • Author

    Wei-Kai Shih ; Hareland, S. ; Jallepalli, S. ; Maziar, C.M. ; Tasch, A.F.

  • Author_Institution
    Microelectron. Res. Center, Texas Univ., Austin, TX, USA
  • fYear
    1996
  • fDate
    26-26 June 1996
  • Firstpage
    28
  • Lastpage
    29
  • Abstract
    Summary form only given. For a typical device simulation one cannot ignore the presence of nonuniformity in realistic MOSFET inversion layers. In this case, computationally demanding Schrodinger-MC-Poisson iteration (SMCPT) seems to be the only viable methodology. In this paper, we present an alternative approach that efficiently includes the quantization effect in the drift-diffusion preprocessing step such that the transport characteristics can be accurately captured without using a SMCPT. For this purpose, PISCES has been chosen as the preprocessor, allowing channel quantization effects to be ignored or treated with either of two models: the 3-subband model (3SB) and the van Dort model.
  • Keywords
    MOS capacitors; MOSFET; Monte Carlo methods; digital simulation; elemental semiconductors; inversion layers; semiconductor device models; silicon; 3-subband model; Monte Carlo study; PISCES; Si; channel quantization effects; device simulation; drift-diffusion preprocessing step; electron transport; inversion layers; nMOSFETs; nonuniformity; transport characteristics; van Dort model; Artificial intelligence; Electrons; MOSFET circuits; Monte Carlo methods; Poisson equations; Quantization; Schrodinger equation; Silicon; Solid state circuits; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 1996. Digest. 54th Annual
  • Conference_Location
    Santa Barbara, CA, USA
  • Print_ISBN
    0-7803-3358-6
  • Type

    conf

  • DOI
    10.1109/DRC.1996.546303
  • Filename
    546303