• DocumentCode
    2343355
  • Title

    Fully-integrated dynamic fault imaging system for failure analysis and performance enhancement of VLSI

  • Author

    Pelissier, Jean-Luc ; Flinois, Xavier

  • Author_Institution
    Schlumberger Technol., Paris, France
  • fYear
    1989
  • fDate
    12-14 Apr 1989
  • Firstpage
    180
  • Lastpage
    183
  • Abstract
    Advances in electron-beam dynamic fault imaging (DFI) are reviewed. DFI is a powerful technique for diagnosing failure mechanisms in VLSI devices, and is particularly helpful in situations where there is little knowledge of the device under test. It provides direct automated comparison of images from a failing die and a fully functional or `golden´ die, greatly, increasing diagnosis productivity. A number of key problems historically associated with this technique are discussed
  • Keywords
    VLSI; automatic testing; computerised picture processing; electron beam applications; fault location; integrated circuit testing; scanning electron microscopy; SEM; VLSI devices; diagnosis productivity; direct automated comparison; dynamic fault imaging system; electron beam application; failing die; failure analysis; images; performance enhancement; Automatic testing; Electron beams; Failure analysis; Fault diagnosis; Knowledge engineering; Power engineering and energy; Productivity; System testing; Very large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    European Test Conference, 1989., Proceedings of the 1st
  • Conference_Location
    Paris
  • Print_ISBN
    0-8186-1937-6
  • Type

    conf

  • DOI
    10.1109/ETC.1989.36241
  • Filename
    36241