DocumentCode
2343355
Title
Fully-integrated dynamic fault imaging system for failure analysis and performance enhancement of VLSI
Author
Pelissier, Jean-Luc ; Flinois, Xavier
Author_Institution
Schlumberger Technol., Paris, France
fYear
1989
fDate
12-14 Apr 1989
Firstpage
180
Lastpage
183
Abstract
Advances in electron-beam dynamic fault imaging (DFI) are reviewed. DFI is a powerful technique for diagnosing failure mechanisms in VLSI devices, and is particularly helpful in situations where there is little knowledge of the device under test. It provides direct automated comparison of images from a failing die and a fully functional or `golden´ die, greatly, increasing diagnosis productivity. A number of key problems historically associated with this technique are discussed
Keywords
VLSI; automatic testing; computerised picture processing; electron beam applications; fault location; integrated circuit testing; scanning electron microscopy; SEM; VLSI devices; diagnosis productivity; direct automated comparison; dynamic fault imaging system; electron beam application; failing die; failure analysis; images; performance enhancement; Automatic testing; Electron beams; Failure analysis; Fault diagnosis; Knowledge engineering; Power engineering and energy; Productivity; System testing; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
European Test Conference, 1989., Proceedings of the 1st
Conference_Location
Paris
Print_ISBN
0-8186-1937-6
Type
conf
DOI
10.1109/ETC.1989.36241
Filename
36241
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