DocumentCode :
2343355
Title :
Fully-integrated dynamic fault imaging system for failure analysis and performance enhancement of VLSI
Author :
Pelissier, Jean-Luc ; Flinois, Xavier
Author_Institution :
Schlumberger Technol., Paris, France
fYear :
1989
fDate :
12-14 Apr 1989
Firstpage :
180
Lastpage :
183
Abstract :
Advances in electron-beam dynamic fault imaging (DFI) are reviewed. DFI is a powerful technique for diagnosing failure mechanisms in VLSI devices, and is particularly helpful in situations where there is little knowledge of the device under test. It provides direct automated comparison of images from a failing die and a fully functional or `golden´ die, greatly, increasing diagnosis productivity. A number of key problems historically associated with this technique are discussed
Keywords :
VLSI; automatic testing; computerised picture processing; electron beam applications; fault location; integrated circuit testing; scanning electron microscopy; SEM; VLSI devices; diagnosis productivity; direct automated comparison; dynamic fault imaging system; electron beam application; failing die; failure analysis; images; performance enhancement; Automatic testing; Electron beams; Failure analysis; Fault diagnosis; Knowledge engineering; Power engineering and energy; Productivity; System testing; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
European Test Conference, 1989., Proceedings of the 1st
Conference_Location :
Paris
Print_ISBN :
0-8186-1937-6
Type :
conf
DOI :
10.1109/ETC.1989.36241
Filename :
36241
Link To Document :
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