DocumentCode :
2343525
Title :
Control and performance of a pulse-density-modulated series-resonant inverter for corona discharge processes
Author :
Fujita, Hideaki ; Akagi, Hirofumi
Author_Institution :
Dept. of Electr. Eng., Okayama Univ., Japan
Volume :
2
fYear :
1998
fDate :
12-15 Oct. 1998
Firstpage :
1320
Abstract :
This paper presents control and performance of a pulse density-modulated (PDM) series-resonant voltage-source inverter developed for corona discharge processes. The PDM inverter produces either a square-wave a voltage state or a zero-voltage state at its AC terminals to control the average output voltage under constant DC voltage and operating frequency. This results in a wide range of power control from 0.5% to 100% even in the corona discharge load with a strong nonlinear characteristics. A 30 kHz, 8 kW surface treatment system consisting of a voltage-source PDM inverter, a step-up transformer and a corona discharge treater shows the establishment of a stable corona discharge in an extremely wide range of power control, and therefore succeeds in performing both strong and weak surface treatment processes for film.
Keywords :
corona; power control; pulse modulation; resonant power convertors; surface treatment; voltage control; 30 kHz; 8 kW; AC terminals; average output voltage control; corona discharge processes; corona discharge treater; operating frequency; power control; pulse-density-modulated series-resonant inverter; series-resonant voltage-source inverter; square-wave; stable corona discharge; step-up transformer; strong nonlinear characteristics; strong surface treatment processes; surface treatment system; voltage state; voltage-source PDM inverter; weak surface treatment processes; zero-voltage state; Corona; Fault location; Insulated gate bipolar transistors; Power control; Pulse inverters; Pulse width modulation inverters; Resonant inverters; Surface discharges; Surface treatment; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 1998. Thirty-Third IAS Annual Meeting. The 1998 IEEE
Conference_Location :
St. Louis, MO, USA
ISSN :
0197-2618
Print_ISBN :
0-7803-4943-1
Type :
conf
DOI :
10.1109/IAS.1998.730315
Filename :
730315
Link To Document :
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