DocumentCode :
2343852
Title :
Non-equilibrium behavior of low-pressure plasma jets
Author :
Chang, C. Hwa ; Pfender
Author_Institution :
Dept. of Mech. Eng., Minnesota Univ., Minneapolis, MN, USA
fYear :
1989
fDate :
0-0 1989
Firstpage :
148
Abstract :
Summary Form only given, as follows. The establishment of local thermodynamic equilibrium (LTE) in optically thin plasmas requires that collision processes dominate, which implies that large electron densities exist in the plasma. The electron density in low-pressure plasma jets will be marginal for establishing one of the requirements for LTE, namely, ionization equilibrium. Because of this small electron density and high velocities typically encountered in the low-pressure plasma deposition process (LPPD), substantial deviations from ionization equilibrium are expected. Deviations from kinetic equilibrium are also anticipated, because the excess energy that electrons acquire in the recombination processes (three-body recombination) cannot be readily transferred to the heavy species due to the poor collisional coupling between the electrons and the heavy particles. Therefore, it is anticipated that the electron temperature will be higher than the heavy particle temperature. A two-temperature description of plasma jets in chemical nonequilibrium has been developed, using finite rate chemistry for ionization and recombination processes. The results clearly indicate the validity of LTE at atmospheric pressure as well as strong deviations from LTE at lower pressures, especially in terms of chemical equilibrium.<>
Keywords :
plasma collision processes; plasma density; plasma deposition; plasma diagnostics; plasma jets; plasma temperature; plasma transport processes; atmospheric pressure; chemical nonequilibrium; collision processes; collisional coupling; electron densities; electron temperature; finite rate chemistry; heavy particle temperature; heavy particles; ionization equilibrium; kinetic equilibrium; local thermodynamic equilibrium; low-pressure plasma deposition process; low-pressure plasma jets; optically thin plasmas; three-body recombination; two-temperature description; velocities; Charge carrier processes; Particle collisions; Plasma applications; Plasma devices; Plasma measurements; Plasma properties; Temperature; Vapor deposition;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166250
Filename :
166250
Link To Document :
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