DocumentCode :
2344268
Title :
Emission spectroscopic studies of copper contamination in a free-burning argon arc
Author :
Roberts, Mike ; Etemadi
Author_Institution :
Dept. of Electr. & Comput. Eng., State Univ. of New York, Buffalo, NY, USA
fYear :
1989
fDate :
0-0 1989
Firstpage :
149
Lastpage :
150
Abstract :
Summary Form only given, as follows. The vapor density distribution of copper contaminants evaporated from the water-cooled anode of an atmospheric-pressure free-burning arc (200 A and 1-cm gap spacing) was measured by emission spectroscopy. An automated emission spectroscopic setup has been developed in order to minimize the time for data acquisition and data evaluation. The vapor density distribution was measured in a two-step process. In the first step, the temperature distribution in the plasma was measured using the absolute line intensity method at the argon spectral line of 4300 AA. In the second step, the vapor density distribution of copper was determined by measuring the absolute intensity distribution of the copper spectral line at 5218 AA. The measurements show that the copper vapor is mainly concentrated in the fringes of the arc and in the center of the arc column with a radius of 1 mm. The vapor density distribution in the arc column is more concentric toward the cathode tip.<>
Keywords :
arcs (electric); copper; plasma density; plasma diagnostics; plasma impurities; plasma temperature; 4300 AA; 5218 AA; Cu contamination; Cu-Ar; H/sub 2/O-cooled anode; absolute line intensity method; arc fringes; automated emission spectroscopic setup; cathode tip; concentric vapour density distribution; data acquisition; data evaluation; free-burning Ar arc; temperature distribution; vapor density distribution; Arc discharges; Copper; Impurities; Plasma measurements; Plasma properties; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
Type :
conf
DOI :
10.1109/PLASMA.1989.166252
Filename :
166252
Link To Document :
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