• DocumentCode
    2344268
  • Title

    Emission spectroscopic studies of copper contamination in a free-burning argon arc

  • Author

    Roberts, Mike ; Etemadi

  • Author_Institution
    Dept. of Electr. & Comput. Eng., State Univ. of New York, Buffalo, NY, USA
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    149
  • Lastpage
    150
  • Abstract
    Summary Form only given, as follows. The vapor density distribution of copper contaminants evaporated from the water-cooled anode of an atmospheric-pressure free-burning arc (200 A and 1-cm gap spacing) was measured by emission spectroscopy. An automated emission spectroscopic setup has been developed in order to minimize the time for data acquisition and data evaluation. The vapor density distribution was measured in a two-step process. In the first step, the temperature distribution in the plasma was measured using the absolute line intensity method at the argon spectral line of 4300 AA. In the second step, the vapor density distribution of copper was determined by measuring the absolute intensity distribution of the copper spectral line at 5218 AA. The measurements show that the copper vapor is mainly concentrated in the fringes of the arc and in the center of the arc column with a radius of 1 mm. The vapor density distribution in the arc column is more concentric toward the cathode tip.<>
  • Keywords
    arcs (electric); copper; plasma density; plasma diagnostics; plasma impurities; plasma temperature; 4300 AA; 5218 AA; Cu contamination; Cu-Ar; H/sub 2/O-cooled anode; absolute line intensity method; arc fringes; automated emission spectroscopic setup; cathode tip; concentric vapour density distribution; data acquisition; data evaluation; free-burning Ar arc; temperature distribution; vapor density distribution; Arc discharges; Copper; Impurities; Plasma measurements; Plasma properties; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166252
  • Filename
    166252