Title :
Demonstration of efficiency enhancement in a high power backward wave oscillator by plasma injection
Author :
Carmel, Y. ; Destler, W.W. ; Granatstein, V.L. ; Minami, Kazuyuki ; Abe, D. ; Lou ; Kehs
Author_Institution :
Lab. for Plasma Res., Maryland Univ., College Park, MD, USA
Abstract :
Summary Form only given, as follows. A strong enhancement of the interaction efficiency in a high-power relativistic backward wave oscillator when plasma is injected has been demonstrated experimentally. Plasma injection enhances the interaction efficiency by a factor of up to eight to a value of about 40%. Overdriving the device with plasma above a critical density quenches the interaction. It is anticipated that plasma injection will prove beneficial in other high-power microwave and millimeter-wave devices, such as free-electron lasers and gyrotrons. The enhanced interaction is attributed to induced scattering of the electromagnetic radiation of electrons in an electrostatic field produced by the background plasma and a beam space-charge wave in the corrugated interaction region.<>
Keywords :
backward wave tubes; electromagnetic oscillations; electromagnetic wave propagation in plasma; electromagnetic wave scattering; free electron lasers; gyrotrons; plasma applications; plasma density; plasma flow; relativistic electron beam tubes; background plasma; beam space-charge wave; corrugated interaction region; critical density; efficiency enhancement; electromagnetic radiation scattering; electrostatic field; free-electron lasers; gyrotrons; high power backward wave oscillator; high-power microwave devices; high-power millimeter wave devices; interaction quenching; plasma injection; Backward wave tubes; Electromagnetic propagation in plasma media; Electromagnetic scattering; Free electron lasers; Gyrotrons; Plasma applications; Plasma properties; Relativistic effects;
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
DOI :
10.1109/PLASMA.1989.166256