DocumentCode
2345292
Title
Monolithically integrated 3-D micro-inductors and micro-transformers for RF applications
Author
Park, Jae Y. ; Chang, Young J. ; Bu, Jong U.
Author_Institution
Microsystem Group, LG Electron. Inst. of Technol., Seoul, South Korea
fYear
2002
fDate
2002
Firstpage
362
Lastpage
363
Abstract
To meet requirements in mobile communications and microwave integrated circuits, miniaturization of the passive components that many of these systems require is of key importance. In this paper, spiral and solenoid-type RF micro-inductors and micro-transformers with 3-D structures have been newly designed, fabricated, and characterized on GaAs and silicon substrates by using electroplating techniques, multi-layer thick photoresist, and low temperature processes. The applied processing techniques are also compatible with MMIC, RFIC, and CMOS circuitry fabrication due to their simple fabrication steps. In particular, relationship of performance characteristics and geometry of spiral and solenoid micro-inductors and micro-transformers is deeply investigated such as windings, cross-sectional area of core, spacing between windings, and turn ratio. The microwave characteristics of the fabricated micro- inductors and micro-transformers have been measured in the frequency range of 0.5 to 40 GHz for RF applications
Keywords
CMOS integrated circuits; III-V semiconductors; MMIC; elemental semiconductors; gallium arsenide; inductors; integrated circuit technology; mobile radio; passive networks; scanning electron microscopy; semiconductor technology; silicon; solenoids; substrates; transformers; 0.5 to 40 GHz; 3D structures; CMOS; GaAs; MMIC; RFIC; SEM turn ratio 1:1; Si; Si substrates; electroplating; low temperature processes; microwave integrated circuits; miniaturization; mobile communications; multi-layer thick photoresist; passive components; solenoid type micro-inductors; spiral microinductors; turn ratio n:1; Fabrication; Gallium arsenide; MMICs; Microwave integrated circuits; Mobile communication; Radio frequency; Resists; Silicon; Spirals; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Packaging Materials, 2002. Proceedings. 2002 8th International Symposium on
Conference_Location
Stone Mountain, GA
Print_ISBN
0-7803-7434-7
Type
conf
DOI
10.1109/ISAPM.2002.990412
Filename
990412
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