• DocumentCode
    2345319
  • Title

    Firing characteristics of a miniature laser-triggered high-voltage vacuum switch

  • Author

    Earley ; Scott ; Boettcher

  • Author_Institution
    Sandia Nat. Lab., Albuquerque, NM, USA
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    164
  • Lastpage
    165
  • Abstract
    Summary Form only given, as follows. A miniature laser-triggered high-voltage vacuum switch with a fused KCl and Ni cathode has been developed. The switch uses metal-ceramic construction with a sapphire window in the anode to allow the laser beam to strike the cathode surface. Reliable triggering is achieved with only 20 to 40 mu J of laser energy. The switch was operated with a gap voltage ranging from 500 V to 3 kV with switching currents up to 5 kA peak. A switch life greater than 1000 shots without performance degradation has been observed on 25 prototype units. The function time of the switch varies from 10 ns+or-1 ns at 3 kV to 200 ns+or-100 ns at 500 V. Improved performance over a previously reported switch is derived from the fused KCl cathode, a lower inductance of switch and circuit, and the use of an ultra-high-vacuum switch that receives a 600 degrees C bakeout and is pinched off from a vacuum manifold in the 10/sup -9/-torr range. The switch triggering mechanism and the switch turn-on characteristics can be studied more clearly, since a higher-quality vacuum switch and a lower-inductance circuit are being investigated.<>
  • Keywords
    laser beam applications; plasma switches; vacuum tubes; 10E-9 torr; 20 to 40 muJ; 5 kA; 500 V to 3 kV; 600 degC; 9 to 300 ns; KCl-Ni cathode; firing characteristics; gap voltage; metal-ceramic construction; miniature laser-triggered high-voltage vacuum switch; performance degradation; sapphire window; switch life; switch triggering mechanism; switch turn-on; triggering; ultra-high-vacuum switch; vacuum manifold; Electron tubes; Laser applications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166289
  • Filename
    166289