• DocumentCode
    2345762
  • Title

    Wavelength control through lateral device size in a 2/spl times/2 vertical-cavity surface-emitting laser array fabricated using selective oxidation

  • Author

    Huffaker, D.L. ; Deppe, D.G.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
  • fYear
    1996
  • fDate
    26-26 June 1996
  • Firstpage
    86
  • Lastpage
    87
  • Abstract
    To our knowledge, this is the first demonstration of the lasing wavelength control of a VCSEL through its lateral size, and is made possible with the index-guiding due to the selective oxidation. Because the selective oxidation provides an electrical insulator for device isolation, the technique is readily extended to larger scale processing, even denser device packing, and, depending on required wavelength separations, more elements. Further characterization data of far-field radiation patterns, thermal impedances, and electrical impedances, as well as processing details will be presented.
  • Keywords
    optical fabrication; oxidation; semiconductor laser arrays; surface emitting lasers; device isolation; electrical insulator; fabrication; index guiding; lateral size; selective oxidation; vertical-cavity surface-emitting laser array; wavelength control; Application software; Optical arrays; Optical control; Optical microscopy; Oxidation; Scanning electron microscopy; Size control; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 1996. Digest. 54th Annual
  • Conference_Location
    Santa Barbara, CA, USA
  • Print_ISBN
    0-7803-3358-6
  • Type

    conf

  • DOI
    10.1109/DRC.1996.546324
  • Filename
    546324