DocumentCode :
2345762
Title :
Wavelength control through lateral device size in a 2/spl times/2 vertical-cavity surface-emitting laser array fabricated using selective oxidation
Author :
Huffaker, D.L. ; Deppe, D.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
fYear :
1996
fDate :
26-26 June 1996
Firstpage :
86
Lastpage :
87
Abstract :
To our knowledge, this is the first demonstration of the lasing wavelength control of a VCSEL through its lateral size, and is made possible with the index-guiding due to the selective oxidation. Because the selective oxidation provides an electrical insulator for device isolation, the technique is readily extended to larger scale processing, even denser device packing, and, depending on required wavelength separations, more elements. Further characterization data of far-field radiation patterns, thermal impedances, and electrical impedances, as well as processing details will be presented.
Keywords :
optical fabrication; oxidation; semiconductor laser arrays; surface emitting lasers; device isolation; electrical insulator; fabrication; index guiding; lateral size; selective oxidation; vertical-cavity surface-emitting laser array; wavelength control; Application software; Optical arrays; Optical control; Optical microscopy; Oxidation; Scanning electron microscopy; Size control; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 1996. Digest. 54th Annual
Conference_Location :
Santa Barbara, CA, USA
Print_ISBN :
0-7803-3358-6
Type :
conf
DOI :
10.1109/DRC.1996.546324
Filename :
546324
Link To Document :
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