DocumentCode
2347127
Title
Noise analysis methodology for partially depleted SOI circuits
Author
Nanua, Mini ; Blaauw, David
Author_Institution
Motorola Semicond. Product Sector, Austin, TX, USA
fYear
2003
fDate
21-24 Sept. 2003
Firstpage
719
Lastpage
722
Abstract
In PD SOI technology, signal switching history and initial state of the circuit nodes can affect the device body voltage and also cause parasitic BJT leakage currents, which can lead to significant increase in noise propagation and noise failures. In this paper we explore the effects of input switching history, initial circuit conditions and the parasitic BJT device on all steps in a traditional noise analysis methodology: noise injection, noise propagation and noise failure criterion. We present a new noise analysis methodology to account for the floating body and the BJT effects in PD SOI technology. We demonstrate the new technique on an industrial microprocessor design in PD SOI and show that the current noise analysis methods do not account for 56% of noise fails.
Keywords
bipolar transistors; integrated circuit modelling; integrated circuit noise; leakage currents; silicon-on-insulator; PD SOI technology; Si-SiO2; circuit nodes initial state; device body voltage; floating body effects; microprocessor; noise analysis; noise failures; noise injection; noise propagation; parasitic BJT leakage currents; partially depleted SOI circuits; signal switching history; Circuit noise; Failure analysis; History; Latches; Leakage current; Logic; Phase noise; Semiconductor device noise; Switching circuits; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference, 2003. Proceedings of the IEEE 2003
Print_ISBN
0-7803-7842-3
Type
conf
DOI
10.1109/CICC.2003.1249494
Filename
1249494
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