DocumentCode
2349270
Title
Self-heating effects in ultrathin FD SOI transistors
Author
Rodriguez, N. ; Navarro, C. ; Andrieu, F. ; Faynot, O. ; Gamiz, F. ; Cristoloveanu, S.
Author_Institution
Dept. Electron., Univ. of Granada, Granada, Spain
fYear
2011
fDate
3-6 Oct. 2011
Firstpage
1
Lastpage
2
Abstract
We report the impact of self-heating effects (SHE) in 22nm-node Silicon on Insulator transistors with 6nm of silicon film thickness using a high-resolution current setup. The experiments show that, although the impact of SHE is less significant than in high-voltage devices, their role is still present. The average temperature increase in the channel due to self-heating is larger in the longer devices being responsible for decrease in the mobility and threshold voltage.
Keywords
silicon-on-insulator; high-resolution current setup; high-voltage device; mobility; self-heating effects; silicon film thickness; silicon on insulator transistors; threshold voltage; ultrathin FD SOI transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference (SOI), 2011 IEEE International
Conference_Location
Tempe, AZ
ISSN
1078-621X
Print_ISBN
978-1-61284-761-0
Electronic_ISBN
1078-621X
Type
conf
DOI
10.1109/SOI.2011.6081685
Filename
6081685
Link To Document