• DocumentCode
    2349270
  • Title

    Self-heating effects in ultrathin FD SOI transistors

  • Author

    Rodriguez, N. ; Navarro, C. ; Andrieu, F. ; Faynot, O. ; Gamiz, F. ; Cristoloveanu, S.

  • Author_Institution
    Dept. Electron., Univ. of Granada, Granada, Spain
  • fYear
    2011
  • fDate
    3-6 Oct. 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report the impact of self-heating effects (SHE) in 22nm-node Silicon on Insulator transistors with 6nm of silicon film thickness using a high-resolution current setup. The experiments show that, although the impact of SHE is less significant than in high-voltage devices, their role is still present. The average temperature increase in the channel due to self-heating is larger in the longer devices being responsible for decrease in the mobility and threshold voltage.
  • Keywords
    silicon-on-insulator; high-resolution current setup; high-voltage device; mobility; self-heating effects; silicon film thickness; silicon on insulator transistors; threshold voltage; ultrathin FD SOI transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2011 IEEE International
  • Conference_Location
    Tempe, AZ
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-61284-761-0
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2011.6081685
  • Filename
    6081685