Title :
The electrical properties of rf sputtered tantalum oxide films
Author :
Choi, WK ; Ling, CH ; Sundarain, K.
Author_Institution :
National University of Singapore
Keywords :
Capacitance measurement; Capacitance-voltage characteristics; Capacitors; Current measurement; Frequency measurement; Leakage current; Pollution measurement; Sputtering; Substrates; Voltage;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.863877
