Title :
Electrical properties of barium titanate ferroelectric thin films fabricated by rf magnetron sputtering for memory devices application
Author :
Hsu, J.Y. ; Lee, J.Y.M. ; Wang, J. Jay ; Yeh, L.Y. ; Lai, J.T. ; Gong, J.
Author_Institution :
National Tsing-Hua University
Keywords :
Annealing; Barium; Dielectric constant; Dielectric thin films; Ferroelectric materials; Magnetic devices; Magnetic properties; Sputtering; Thin film devices; Titanium compounds;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.863878
