Title :
Characterization of chemical-mechanical planarization processes
Author :
Jang, S.M. ; Hsu, S.L. ; Liu, L.M. ; Lin, M.S. ; Tsai, F.Y. ; Dai, B.T.
Author_Institution :
Taiwan Semiconductor Manufacturing Company
Keywords :
Chemical processes; Chemical technology; Chemical vapor deposition; Degradation; Dielectrics; Etching; Planarization; Scanning electron microscopy; Slurries; Smoothing methods;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.863886
