• DocumentCode
    2349444
  • Title

    Characterization of chemical-mechanical planarization processes

  • Author

    Jang, S.M. ; Hsu, S.L. ; Liu, L.M. ; Lin, M.S. ; Tsai, F.Y. ; Dai, B.T.

  • Author_Institution
    Taiwan Semiconductor Manufacturing Company
  • fYear
    1994
  • fDate
    1994
  • Keywords
    Chemical processes; Chemical technology; Chemical vapor deposition; Degradation; Dielectrics; Etching; Planarization; Scanning electron microscopy; Slurries; Smoothing methods;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.863886
  • Filename
    863886
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2349444