Title :
Effects of dry etching damage removal on Si selective epitaxial growth
Author :
Chang, C.Y. ; Tseng, H.-C. ; Ueng, S.Y. ; Chen, H.C. ; Chen, L.P.
Author_Institution :
National Chiao Tung University
Keywords :
Argon; Contamination; Dry etching; Epitaxial growth; Laboratories; Oxidation; Scanning electron microscopy; Silicon; Surface cleaning; Surface treatment;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.863889
