DocumentCode :
2349563
Title :
Assessment of III–V MOSFET architectures for low power applications using static and dynamic numerical simulation
Author :
Shi, Ming ; Saint-Martin, Jércôme ; Bournel, Arnaud ; Querlioz, Damien ; Dollfus, Philippe ; Mo, Jiongjong ; Wichmann, Nicolas ; Desplanque, Ludovic ; Wallart, Xavier ; Danneville, Francois ; Bollaert, Sylvain
Author_Institution :
IEF, Univ. Paris Sud, Orsay, France
fYear :
2011
fDate :
3-6 Oct. 2011
Firstpage :
1
Lastpage :
2
Abstract :
To fulfill high-speed and low-power specifications for both logic and analog applications, III-V FETs with high-κ gate dielectric stack are especially appealing, in particular for their ability to operate under low power supply voltage. Using complementary tools such as a 2D Poisson-Schrödinger solver and a Monte Carlo device simulator, we assess the potentiality of several III-V MOSFET structures in terms of gate charge control, static/dynamic performance and noise.
Keywords :
III-V semiconductors; MOSFET; Monte Carlo methods; high-k dielectric thin films; low-power electronics; semiconductor device models; stochastic processes; III-V MOSFET architectures; analog applications; dynamic numerical simulation; gate charge control; high gate dielectric stack; high speed specifications; logic applications; low power applications; low power specifications; static numerical simulation; Aluminum oxide; Capacitance-voltage characteristics; Cutoff frequency; Gain; HEMTs; Logic gates; Quantum capacitance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference (SOI), 2011 IEEE International
Conference_Location :
Tempe, AZ
ISSN :
1078-621X
Print_ISBN :
978-1-61284-761-0
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2011.6081701
Filename :
6081701
Link To Document :
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