• DocumentCode
    2349568
  • Title

    The influences of nitrogen, helium, hydrogen, or argon dilution on plasma-enhanced chemical vapor deposited a-SiNx:H

  • Author

    Chang, Chun-Yen ; Hsieh, Shou-Wei ; Lee, Yeong-Shyang ; Lin, Chiung-Wei

  • Author_Institution
    National Chiao Tung University
  • fYear
    1994
  • fDate
    1994
  • Keywords
    Argon; Chemicals; Gases; Helium; Hydrogen; Nitrogen; Plasma chemistry; Plasma temperature; Semiconductor films; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.863892
  • Filename
    863892
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2349568