• DocumentCode
    2349823
  • Title

    Asymmetric self-cascode configuration to improve the analog performance of SOI nMOS transistors

  • Author

    de Souza, M. ; Flandre, Denis ; Pavanello, M.A.

  • Author_Institution
    Dept. of Electr. Eng., FEI, Brazil
  • fYear
    2011
  • fDate
    3-6 Oct. 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A recent work showed that gD of long-channel self-cascode transistors can be further reduced by replacing M2 with a transistor with intrinsic concentration in the channel. In order to extend this proposal to more recent technologies, the current work presents an analysis of short-channel asymmetric self-cascode transistors implemented using a multi-threshold voltage commercial process. Numerical simulations were also performed aiming to extend the study, searching for the optimal doping concentration and length for M1 and M2.
  • Keywords
    MOSFET; silicon-on-insulator; SOI; analog performance; asymmetric self cascode configuration; long channel self cascode transistors; multi threshold voltage commercial process; nMOS transistors; short channel asymmetric self cascode transistors; Degradation; Doping; Logic gates; MOSFETs; Numerical simulation; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2011 IEEE International
  • Conference_Location
    Tempe, AZ
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-61284-761-0
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2011.6081716
  • Filename
    6081716