Introduction of a surface charge analysis instrument into the microelectronic engineering curricula at the Rochester Institute of Technology

Author

Jackson, Michael A. ; Will, James A., II

Author_Institution

Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA

fYear

1995

fDate

16-17 May 1995

Firstpage

237

Lastpage

240

Abstract

A SCA-2000 Surface Charge Analyzer has been loaned to the Microelectronic Engineering Department at RIT for use in undergraduate laboratories and research projects. To illustrate the process monitoring capability of the SCA, a designed experiment was performed to study the effects of variations in post-oxidation anneal and pull temperature on total oxide charge (Q_ox). The SCA measurements on the as grown oxide were compared to C-V results from capacitors fabricated on the same films. Although absolute values of Q_ox did not match, an overall correlation between the two sets of data was observed. It is hypothesized that the lower Q_ox values observed with C-V are the result of hydrogen passivation of Q_it

Keywords

charge measurement; computerised monitoring; educational technology; electronic engineering education; student experiments; surface charging; H passivation; Rochester Institute of Technology; SCA-2000; microelectronic engineering curricula; post-oxidation anneal; process monitoring capability; pull temperature; research projects; surface charge analysis instrument; total oxide charge; undergraduate laboratories; Annealing; Capacitance-voltage characteristics; Capacitors; Hydrogen; Instruments; Laboratories; Microelectronics; Monitoring; Passivation; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1995., Proceedings of the Eleventh Biennial

Conference_Location

Austin, TX

ISSN

0749-6877

Print_ISBN

0-7803-2596-6

Type

conf

DOI

10.1109/UGIM.1995.514152

Filename

514152