DocumentCode :
2351145
Title :
FDSOI design portability from BULK at 20nm node
Author :
Pelloie, Jean-Luc
Author_Institution :
SOI Technol., ARM Grenoble, Grenoble, France
fYear :
2011
fDate :
3-6 Oct. 2011
Firstpage :
1
Lastpage :
29
Abstract :
A standard BULK ASIC design flow can be used for FDSOI, an existing BULK logic design can be directly ported to FDSOI and expected to bring tremendous advantage like: low-voltage high-performance, in low voltage SRAM undoped channel brings higher margins and better RF features if you combine high-resistivity substrate are discussed. FDSOI process on SOI wafer are also discussed.
Keywords :
SRAM chips; application specific integrated circuits; logic design; silicon-on-insulator; BULK ASIC design flow; BULK logic design; FDSOI design portability; RF feature; SOI wafer; Si; low voltage SRAM; size 20 nm; Application specific integrated circuits; Batteries; History; IP networks; Industries; Production; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference (SOI), 2011 IEEE International
Conference_Location :
Tempe, AZ
ISSN :
1078-621X
Print_ISBN :
978-1-61284-761-0
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2011.6081796
Filename :
6081796
Link To Document :
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