DocumentCode
2351884
Title
Interval-valued reduced order statistical interconnect modeling
Author
Ma, James D. ; Rutenbar, Rob A.
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
460
Lastpage
467
Abstract
We show how recent advances in the handling of correlated interval representations of range uncertainty can be used to predict the impact of statistical manufacturing variations on linear interconnect. We represent correlated statistical variations in RLC parameters as sets of correlated intervals, and show how classical model order reduction methods - AWE and PRIMA - can be re-targeted to compute interval-valued, rather than scalar-valued reductions. By applying a statistical interpretation and sampling to the resulting compact interval-valued model, we can efficiently estimate the impact of variations on the original circuit. Results show the technique can predict mean delay with errors between 5-10%, for correlated RLC parameter variations up to 35%.
Keywords
integrated circuit design; integrated circuit interconnections; integrated circuit modelling; reduced order systems; statistical analysis; AWE; PRIMA; RLC parameters; classical model order reduction methods; correlated interval representations; correlated statistical variations; interval-valued reductions; interval-valued statistical interconnect modeling; linear interconnect; range uncertainty; reduced order statistical interconnect modeling; statistical manufacturing variations; Delay estimation; Gaussian distribution; Integrated circuit interconnections; Manufacturing; RLC circuits; Sampling methods; Semiconductor device manufacture; Statistical distributions; Timing; Uncertainty;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Aided Design, 2004. ICCAD-2004. IEEE/ACM International Conference on
ISSN
1092-3152
Print_ISBN
0-7803-8702-3
Type
conf
DOI
10.1109/ICCAD.2004.1382621
Filename
1382621
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