The application of silicon-on-insulator (SOI) technology for the fabrication of fully scanned active matrix flat panel displays

Author

Ipri, A.C. ; Dolny, G. ; Hsueh, F-L ; Stewart, R.G. ; Jose, D. ; Spitzer, M. ; Vu, D.-P. ; Batty, M. ; Khormaei, R. ; Thayer, S. ; Keyser, T. ; Becker, G. ; Tilton, M. ; Rhoades, R.

Author_Institution

David Sarnoff Res. Center, Princeton, NJ, USA

fYear

1994

fDate

3-6 Oct 1994

Firstpage

97

Lastpage

98

Abstract

SOI technology is presently being used for the fabrication of both liquid crystal displays (LCDs) and electroluminescent (EL) displays. It has unique advantages for the fabrication of flat panel displays such as the production of devices with high performance and high breakdown voltage. It is the object of this paper to review the process technologies used in the fabrication of these displays and also to show the latest developments in these technologies

Keywords

electric breakdown; electroluminescent displays; flat panel displays; liquid crystal displays; silicon-on-insulator; SOI technology; active matrix flat panel displays; breakdown voltage; electroluminescent displays; fully scanned displays; liquid crystal displays; process technologies; Active matrix liquid crystal displays; Active matrix technology; Electrodes; Fabrication; Flat panel displays; Glass; Liquid crystal displays; Optical arrays; Silicon on insulator technology; Transmission line matrix methods;

fLanguage

English

Publisher

ieee

Conference_Titel

SOI Conference, 1994 Proceedings., 1994 IEEE International

Conference_Location

Nantucket, MA

Print_ISBN

0-7803-2406-4

Type

conf

DOI

10.1109/SOI.1994.514264

Filename

514264