DocumentCode :
2352777
Title :
Motorola´s strategy for reducing PFC emissions
Author :
Beu, Laurie ; Brown, Paul Thomas
Author_Institution :
Motorola Inc., Austin, TX, USA
fYear :
1998
fDate :
19-21 Oct 1998
Firstpage :
277
Lastpage :
285
Abstract :
PFCs are used in the semiconductor industry for plasma etching and chamber cleaning. The Kyoto Protocol, the DuPont policy, and the Memorandum of Understanding (MOU) that many semiconductor manufacturers signed with the US Environmental Protection Agency (EPA) are driving forces behind the reduction of PFC emissions. The Kyoto Protocol includes perfluorocarbons (PFCs), hydrofluorocarbons (HFCs) and sulfur hexafluoride (SF6) in the basket of greenhouse gases which are subject to emissions reduction requirements during 2008-2012. DuPont, the sole US manufacturer of C2F6, issued a policy which requires industry to implement emissions reduction solutions in 1999. The EPA/MOU requires a two year technology development period (ending Spring, 1998), after which time the industry will meet with EPA to discuss establishment of specific reduction targets. Japan, Europe and Korea have developed voluntary PFC emissions reduction initiatives for semiconductor operations in their countries similar to the EPA MOU. Motorola has worked preactively over the past five years to understand its contribution to PFC emissions and to identify means for controlling emissions. This paper summarizes Motorola´s research and development of PFC emissions reduction techniques. It also discusses the factors that affect the application of reduction technologies. The paper concludes with a discussion of Motorola´s strategy for reducing PFC emissions
Keywords :
environmental factors; integrated circuit technology; legislation; organic compounds; sputter etching; surface cleaning; DuPont policy; HFC emissions; Kyoto Protocol; Memorandum of Understanding; Motorola; PFC emission control; PFC emission reduction strategy; PFC emissions; SF6; SF6 emissions; US EPA; US Environmental Protection Agency; chamber cleaning; emission reduction targets; emission reduction technology application factors; emissions reduction; hydrofluorocarbon emissions; perfluorocarbon emissions; plasma etching; semiconductor industry; semiconductor manufacturers; sulfur hexafluoride emissions; technology development period; voluntary PFC emissions reduction initiatives; Cleaning; Electronics industry; Etching; Hybrid fiber coaxial cables; Manufacturing industries; Plasma applications; Plasma materials processing; Protection; Protocols; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1998. Twenty-Third IEEE/CPMT
Conference_Location :
Austin, TX
ISSN :
1089-8190
Print_ISBN :
0-7803-4523-1
Type :
conf
DOI :
10.1109/IEMT.1998.731084
Filename :
731084
Link To Document :
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