Title :
Room temperature self-organized quantum dot transistors
Author :
Phillips, J. ; Kamath, K. ; Brock, K.T. ; Bhattacharya, P.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
Semiconductor quantum dots (QDs), due to the discrete nature of their density of states, are very attractive for optoelectronic and electronic devices. Quantum dot single electron transistors are highly sought after for low power and high-density semiconductor memory and logic devices. Strained layer growth in the Stranski-Krastanow growth mode, referred to as self-organized growth, is a promising method for producing regular arrays of dislocation free quantum dots without post-growth transistors at low temperature. There have been a variety of reports on the nonlinear transport properties of quantum dot transistors at low temperature. We report a novel field-effect transistor with quantum dots in close proximity to a quantum well channel, demonstrating steps and nonlinear transport properties at room temperature. MODFET structures were grown by MBE, consisting of an InGaAs quantum well channel grown on GaAs, with a delta-doped AlGaAs barrier. A layer of self-organized InAs quantum dots were grown 2.5 nm above the channel and the structure was delta-doped at n=1×1(12) cm/sup -2/ at a distance of 5 nm above the channel. Transistors were fabricated with 0.3 μm gates through e-beam lithography, optical lithography, wet chemical etching, and metallization.
Keywords :
III-V semiconductors; electron beam lithography; electronic density of states; etching; high electron mobility transistors; indium compounds; molecular beam epitaxial growth; photolithography; semiconductor device metallisation; semiconductor growth; semiconductor quantum dots; semiconductor quantum wells; single electron transistors; 2.5 nm; 20 C; 5 nm; GaAs; GaAs substrate; InAs-AlGaAs-InGaAs-GaAs; InGaAs quantum well channel; MBE growth; MODFET structures; Stranski-Krastanow growth mode; delta-doped AlGaAs barrier; delta-doped structure; discrete density of states; dislocation-free quantum dot arrays; e-beam lithography; electronic devices; field-effect transistor; metallization; nonlinear transport properties; optical lithography; optoelectronic devices; post-growth transistors; quantum dot single electron transistors; quantum dot transistors; quantum dots; quantum well channel; room temperature self-organized quantum dot transistors; self-organized InAs quantum dots; self-organized growth; self-organized quantum dot transistors; semiconductor logic devices; semiconductor memory devices; semiconductor quantum dots; strained layer growth; wet chemical etching; FETs; HEMTs; Indium gallium arsenide; Lithography; Logic devices; MODFETs; Quantum dots; Semiconductor memory; Single electron transistors; Temperature;
Conference_Titel :
Device Research Conference Digest, 1998. 56th Annual
Conference_Location :
Charlottesville, VA, USA
Print_ISBN :
0-7803-4995-4
DOI :
10.1109/DRC.1998.731115