Title :
A new spin-valve magnetic memory cell based on patterned single-domain magnetic multilayer NiFe/Cu/Co
Author :
Kong, L. ; Pan, Q. ; Li, M. ; Cui, B. ; Chou, S.Y.
Author_Institution :
NanoStructure Lab., Princeton Univ., NJ, USA
Abstract :
In a conventional spin-valve magnetic memory cell, where a nonmagnetic metal is sandwiched between two-magnetic layers, the magnetization of one magnetic layer (the pinned layer) is fixed by an anti-ferromagnetic FeMn layer (the pinning layer). However, the FeMn can be easily oxidized, creating instability. In this paper, we demonstrate a new spin-valve magnetic cell, where the magnetization of one magnetic layer is fixed through the spontaneous formation of a single-domain due to nanopatterning, and pinning layers (such as FeMn) are no longer required. Magnetic multilayer samples with a NiFe(10 nm)/Co(1 nm)/Cu(13 nm)/Co(10 nm)/NiFe(2 nm) structure were deposited on a SiO/sub 2/ substrate using a DC sputtering system. The samples were patterned using nanoimprint lithography and an ion milling process.
Keywords :
cobalt; copper; ion beam applications; iron alloys; lithography; machining; magnetic domains; magnetic film stores; magnetic multilayers; magnetic switching; nanotechnology; nickel alloys; spin valves; spontaneous magnetisation; sputter deposition; 1 nm; 10 nm; 13 nm; 2 nm; DC sputtering system; FeMn oxidation; NiFe-Co-Cu-Co-NiFe; NiFe-Co-Cu-Co-NiFe magnetic multilayer structure; SiO/sub 2/; SiO/sub 2/ substrate; anti-ferromagnetic FeMn pinning layer; instability; ion milling process; magnetic layers; magnetic multilayer samples; magnetization; nanoimprint lithography; nanopatterning; nonmagnetic metal; patterned single-domain magnetic multilayer NiFe/Cu/Co; pinned layer; spin-valve magnetic cell; spin-valve magnetic memory cell; spontaneous single-domain formation; Antiferromagnetic materials; Magnetic memory; Magnetic multilayers; Magnetization; Milling; Nanolithography; Nanopatterning; Sputtering;
Conference_Titel :
Device Research Conference Digest, 1998. 56th Annual
Conference_Location :
Charlottesville, VA, USA
Print_ISBN :
0-7803-4995-4
DOI :
10.1109/DRC.1998.731117