Title :
Adhesive enabling technology for directly plating copper onto glass/ceramic substrates
Author :
Hailuo Fu ; Hunegnaw, Sara ; Zhiming Liu ; Brandt, Lutz ; Magaya, Tafadwa
Author_Institution :
Atotech USA Inc., Englewood, CO, USA
Abstract :
This study showcases that metal oxide adhesion promoters (MOAP) can function as strong adhesive layers between plated Cu and glass/ceramic. In this new approach a 10-200 nm thick metal oxide layer is deposited by a modified sol gel process followed by sintering. This enables reliable electroless and electrolytic metallization of glass or ceramic substrates. With the new approach, Cu can be plated on a variety of glass types. Substrate roughness appears to have only limited impact. The new approach also can be extended to ceramics such as Al2O3 and BaTiO3. Cu film of over 50 μm thickness can be deposited without delamination. Adhesion of 15 μm thick Cu layers as measured by 90° peel strength tests can achieve well above 5 N/cm. The plated layer stands up well to solder reflow shock (260°C) and HAST without significant loss of adhesion. Good coverage of the MOAP layer and excellent copper adhesion inside the via holes of patterned substrates have been also demonstrated. There is no indication of blockages of holes with diameters >20 μm by the process.
Keywords :
adhesion; adhesive bonding; ceramics; copper; electroplating; glass; metallisation; sintering; sol-gel processing; substrates; HAST; MOAP; adhesive enabling technology; adhesive layer; ceramic substrate; copper adhesion; delamination; direct copper plating; electroless metallization; electrolytic metallization; glass substrate; metal oxide adhesion promoters; metal oxide layer; peel strength test; sintering; size 10 nm to 200 nm; size 15 mum; sol gel process; solder reflow shock; substrate roughness;
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2014 IEEE 64th
Conference_Location :
Orlando, FL
DOI :
10.1109/ECTC.2014.6897517