3D simulation system for moving mask deep X-ray lithography

Author

Hirai, Yoshikazu ; Matsuzuka, Naoki ; Hafizovic, S. ; Korvink, Jan G. ; Tabata, Osamu

Author_Institution

Graduate Sch. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan

fYear

2003

fDate

19-22 Oct. 2003

Firstpage

271

Lastpage

276

Abstract

This paper presents a new 3-dimensional (3D) simulation system for moving mask deep X-ray lithography (M²DXL) technique. The newly developed X-ray lithography simulation system named X-ray lithography simulation system for 3-dimensional fabrication (X3D) is tailored to simulate the fabrication process of 3D microstructures using the M²DXL technique. We have adopted the fast marching method for the development module, and confirmed that X3D correctly predicts the 3D dissolution process of exposed PMMA. A general overview on the X3D, the new approach with the fast marching method to predict 3D microstructures, and the verification of the simulation result are presented.

Keywords

X-ray lithography; X-ray masks; crystal microstructure; digital simulation; micromechanical devices; 3-dimensional fabrication; 3D dissolution process; 3D microstructures; 3D simulation system; M²DXL technique; X3D; development module; fabrication process; fast marching method; moving mask deep X-ray lithography; Controllability; Fabrication; Microactuators; Microelectromechanical devices; Microstructure; Predictive models; Resists; Shape control; Solid modeling; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Micromechatronics and Human Science, 2003. MHS 2003. Proceedings of 2003 International Symposium on

Print_ISBN

0-7803-8165-3

Type

conf

DOI

10.1109/MHS.2003.1249947

Filename

1249947