Title :
3D simulation system for moving mask deep X-ray lithography
Author :
Hirai, Yoshikazu ; Matsuzuka, Naoki ; Hafizovic, S. ; Korvink, Jan G. ; Tabata, Osamu
Author_Institution :
Graduate Sch. of Sci. & Eng., Ritsumeikan Univ., Shiga, Japan
Abstract :
This paper presents a new 3-dimensional (3D) simulation system for moving mask deep X-ray lithography (M2DXL) technique. The newly developed X-ray lithography simulation system named X-ray lithography simulation system for 3-dimensional fabrication (X3D) is tailored to simulate the fabrication process of 3D microstructures using the M2DXL technique. We have adopted the fast marching method for the development module, and confirmed that X3D correctly predicts the 3D dissolution process of exposed PMMA. A general overview on the X3D, the new approach with the fast marching method to predict 3D microstructures, and the verification of the simulation result are presented.
Keywords :
X-ray lithography; X-ray masks; crystal microstructure; digital simulation; micromechanical devices; 3-dimensional fabrication; 3D dissolution process; 3D microstructures; 3D simulation system; M2DXL technique; X3D; development module; fabrication process; fast marching method; moving mask deep X-ray lithography; Controllability; Fabrication; Microactuators; Microelectromechanical devices; Microstructure; Predictive models; Resists; Shape control; Solid modeling; X-ray lithography;
Conference_Titel :
Micromechatronics and Human Science, 2003. MHS 2003. Proceedings of 2003 International Symposium on
Print_ISBN :
0-7803-8165-3
DOI :
10.1109/MHS.2003.1249947
