DocumentCode :
235574
Title :
Fine-pitch probing on TSVs and microbumps using a chip prober having a transparent membrane probe card
Author :
Watanabe, N. ; Eto, Masamichi ; Kawano, Katsumi ; Aoyagi, Masahiro
Author_Institution :
Nanoelectron. Res. Inst., Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
fYear :
2014
fDate :
27-30 May 2014
Firstpage :
2003
Lastpage :
2007
Abstract :
For the chip-level pre-bond testing of a three-dimensional integrated circuit, we fabricated a transparent membrane probe card which had 20-μm-pitch probes on a polyethylene naphthalate film. It was fabricated by photolithography, Ti-Au sputtering, Au electroplating, Ni electroplating, electroless Au plating, and wet etching of the seed layer. Using the transparent membrane probe card and the chip prober, we could successfully conduct direct probing of 20-μm-pitch Cu-SnAg microbumps and through-silicon vias even when the tested chip was very thin (thickness: 30-50 μm).
Keywords :
copper alloys; electroplating; etching; integrated circuit manufacture; integrated circuit technology; integrated circuit testing; photolithography; polymer films; probes; silver alloys; sputtering; three-dimensional integrated circuits; tin alloys; Au electroplating; CuSnAg; Ni electroplating; TSV; Ti- Au sputtering; chip prober; chip-level prebond testing; electroless Au plating; fine-pitch probing; microbump; photolithography; polyethylene naphthalate film; seed layer; size 20 mum; three-dimensional integrated circuit; through-silicon vias; transparent membrane probe card; wet etching; Conferences; Films; Gold; Probes; Testing; Three-dimensional displays; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2014 IEEE 64th
Conference_Location :
Orlando, FL
Type :
conf
DOI :
10.1109/ECTC.2014.6897577
Filename :
6897577
Link To Document :
بازگشت