DocumentCode :
235663
Title :
Chemical mechanical properties of perovskite oxide abrasive grain: First-principles approach
Author :
Ozawa, Nobuki ; Higuchi, Yuji ; Kubo, Momoji
Author_Institution :
Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear :
2014
fDate :
19-21 Nov. 2014
Firstpage :
203
Lastpage :
204
Abstract :
To elucidate the chemical mechanical polishing (CMP) performance of perovskite oxide abrasive grain for glass, we investigated electronic states of CaZrO3 and SrFeO3 by the first-principles calculation. The calculation results show that the Zr and Fe atoms in CaZrO3 and SrFeO3 take low valence states. We suggest that the metal atoms in perovskite oxide are effective for the glass polishing since low-valent metal atoms can weaken the Si-O bond of the glass surface by electron donation based on our reported CMP mechanism of glass by CeO2 abrasive grains.
Keywords :
ab initio calculations; abrasion; calcium compounds; chemical mechanical polishing; strontium compounds; CaZrO3; SrFeO3; chemical mechanical polishing; chemical mechanical properties; electron donation; electronic states; first-principles calculation; glass polishing; low-valent metal atoms; perovskite oxide abrasive grain; valence states; Abrasives; Chemicals; Crystals; Glass; Iron; Zirconium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location :
Kobe
Print_ISBN :
978-1-4799-5556-5
Type :
conf
DOI :
10.1109/ICPT.2014.7017280
Filename :
7017280
Link To Document :
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