Title :
The experiment of applying a plasma chemical reaction and a nonplasma chemical reaction in the RF ion source
Author_Institution :
Inst. of Low Energy Nucl. Phys., Beijing Normal Univ., China
Abstract :
The author reports an experimental study regarding the application of a plasma chemical reaction and to nonplasma chemical reaction in an RF ion source. Conditions were established under which the plasma denudation rate compares with that for nonplasma. The experiment made it possible to select the structure of the metal ion extracted by the applying plasma chemical reaction in the RF ion source
Keywords :
chemical reactions; ion sources; RF ion source; metal ion; nonplasma chemical reaction; plasma chemical reaction; plasma denudation rate; Chemical processes; Chromium; Coils; Fault location; Glass; Plasma chemistry; Plasma materials processing; Plasma sources; Radio frequency; Tungsten;
Conference_Titel :
Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE
Conference_Location :
Chicago, IL
DOI :
10.1109/PAC.1989.73146
