DocumentCode
2359517
Title
Analog, RF and nonlinear behaviors of submicron graded channel partially depleted SOI MOSFETs
Author
Emam, M. ; Pavanello, M.A. ; Danneville, F. ; Vanhoenacker-Janvier, D. ; Raskin, J.P.
Author_Institution
Microwave Lab. (EMIC), Univ. catholique de Louvain, Louvain-la-Neuve, Belgium
fYear
2009
fDate
14-18 Sept. 2009
Firstpage
125
Lastpage
128
Abstract
The DC, analog and RF behaviors as well as the nonlinear characteristics are shown for the first time for submicron graded channel partially depleted SOI MOSFETs. Previously reported advantages of long graded channel devices are extended for downscaled submicron graded channel devices presented in this work. These advantages cover all aspects of operation, being DC, analog, RF and nonlinear performances, which are investigated in comparison with classical MOS devices. These results are confirmed through robust measurements and accurate characterization techniques supported by well established extraction methods, especially for RF and nonlinear regimes of operation.
Keywords
MOSFET; silicon-on-insulator; Si; classical MOS devices; extraction methods; nonlinear performances; submicron graded channel devices; submicron graded channel partially depleted SOI MOSFET; Doping; Harmonic distortion; Laboratories; MOS devices; MOSFETs; Noise figure; Radio frequency; Robustness; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location
Athens
ISSN
1930-8876
Print_ISBN
978-1-4244-4351-2
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2009.5331397
Filename
5331397
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