DocumentCode :
2359517
Title :
Analog, RF and nonlinear behaviors of submicron graded channel partially depleted SOI MOSFETs
Author :
Emam, M. ; Pavanello, M.A. ; Danneville, F. ; Vanhoenacker-Janvier, D. ; Raskin, J.P.
Author_Institution :
Microwave Lab. (EMIC), Univ. catholique de Louvain, Louvain-la-Neuve, Belgium
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
125
Lastpage :
128
Abstract :
The DC, analog and RF behaviors as well as the nonlinear characteristics are shown for the first time for submicron graded channel partially depleted SOI MOSFETs. Previously reported advantages of long graded channel devices are extended for downscaled submicron graded channel devices presented in this work. These advantages cover all aspects of operation, being DC, analog, RF and nonlinear performances, which are investigated in comparison with classical MOS devices. These results are confirmed through robust measurements and accurate characterization techniques supported by well established extraction methods, especially for RF and nonlinear regimes of operation.
Keywords :
MOSFET; silicon-on-insulator; Si; classical MOS devices; extraction methods; nonlinear performances; submicron graded channel devices; submicron graded channel partially depleted SOI MOSFET; Doping; Harmonic distortion; Laboratories; MOS devices; MOSFETs; Noise figure; Radio frequency; Robustness; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location :
Athens
ISSN :
1930-8876
Print_ISBN :
978-1-4244-4351-2
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2009.5331397
Filename :
5331397
Link To Document :
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