• DocumentCode
    2359517
  • Title

    Analog, RF and nonlinear behaviors of submicron graded channel partially depleted SOI MOSFETs

  • Author

    Emam, M. ; Pavanello, M.A. ; Danneville, F. ; Vanhoenacker-Janvier, D. ; Raskin, J.P.

  • Author_Institution
    Microwave Lab. (EMIC), Univ. catholique de Louvain, Louvain-la-Neuve, Belgium
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    125
  • Lastpage
    128
  • Abstract
    The DC, analog and RF behaviors as well as the nonlinear characteristics are shown for the first time for submicron graded channel partially depleted SOI MOSFETs. Previously reported advantages of long graded channel devices are extended for downscaled submicron graded channel devices presented in this work. These advantages cover all aspects of operation, being DC, analog, RF and nonlinear performances, which are investigated in comparison with classical MOS devices. These results are confirmed through robust measurements and accurate characterization techniques supported by well established extraction methods, especially for RF and nonlinear regimes of operation.
  • Keywords
    MOSFET; silicon-on-insulator; Si; classical MOS devices; extraction methods; nonlinear performances; submicron graded channel devices; submicron graded channel partially depleted SOI MOSFET; Doping; Harmonic distortion; Laboratories; MOS devices; MOSFETs; Noise figure; Radio frequency; Robustness; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
  • Conference_Location
    Athens
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-4351-2
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2009.5331397
  • Filename
    5331397