DocumentCode :
2359955
Title :
Fab implementation of a system for cleaning wafers which survive wafer-breakage events
Author :
Hilscher, David F.
Author_Institution :
MiCRUS, Hopewell Junction, NY, USA
fYear :
1998
fDate :
23-25 Sep 1998
Firstpage :
156
Lastpage :
158
Abstract :
Wafer-breakage events are detrimental to the productivity of a semiconductor fab in two ways. The loss of product revenue is obvious, but more subtle is the yield impact of wafers in proximity to the breakage event. This collateral damage can impact the final test yield of the surviving wafers, as well as potentially contaminate tools which subsequently process these wafers. This paper describes the evolution and factory-wide implementation of a system for rework cleaning of such wafers, and an estimate of the yield improvement from its implementation
Keywords :
fracture; integrated circuit testing; integrated circuit yield; production testing; surface cleaning; surface contamination; collateral damage; factory-wide implementation; final test yield; product revenue loss; productivity; rework cleaning; semiconductor fab; tool contamination; wafer breakage event proximity; wafer cleaning system; wafer fab implementation; wafer-breakage event survival; yield impact; yield improvement; Cleaning; Contamination; Frequency; Inspection; Particle measurements; Pollution measurement; Postal services; Productivity; Silicon; Spraying;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1998. 1998 IEEE/SEMI
Conference_Location :
Boston, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-4380-8
Type :
conf
DOI :
10.1109/ASMC.1998.731480
Filename :
731480
Link To Document :
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