DocumentCode :
2359984
Title :
Modeling the residual shrinkage during lithographic processing on flexible polymer substrates
Author :
Barink, M. ; Van den Berg, D. ; Yakimets, I. ; Meinders, E.
Author_Institution :
Holst Centre, TNO, Eindhoven, Netherlands
fYear :
2010
fDate :
26-28 April 2010
Firstpage :
1
Lastpage :
5
Abstract :
The challenge of lithographic production of electronic circuitry on polymer foil is that deformations approaching the feature sizes of the circuitry can cause considerable overlay problems and thereby malfunctioning of the devices. The substrate foil is susceptible to several types of deformations. Accurate prediction of these deformations is of great importance, as it will help to improve the production process and thereby improve the quality of the electronic devices. One of the deformations is the residual shrinkage, a deformation that occurs after application of a heat step to a polymer foil. This study presents an experimental investigation of residual shrinkage combined with a modeling approach in which the temperature dependent visco-elastic material properties of the foil are used. The model enables us to more accurately predict overlay errors.
Keywords :
lithography; polymer films; shrinkage; viscoelasticity; deformations; flexible polymer substrate; lithographic processing; polymer foil; residual shrinkage; visco-elastic material property; Circuits; Crystalline materials; Flat panel displays; Industrial electronics; Internal stresses; Lithography; Organic light emitting diodes; Plastics; Polymers; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE), 2010 11th International Conference on
Conference_Location :
Bordeaux
Print_ISBN :
978-1-4244-7026-6
Type :
conf
DOI :
10.1109/ESIME.2010.5464564
Filename :
5464564
Link To Document :
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