• DocumentCode
    2360000
  • Title

    Copper pillar bump structure optimization for flip chip packaging with Cu/Low-K stack

  • Author

    Zhang, X.R. ; Zhu, W.H. ; Liew, RP ; Gaurav, M. ; Yeo, A. ; Chan, K.C.

  • Author_Institution
    United Test & Assembly Center Ltd. (UTAC), Singapore, Singapore
  • fYear
    2010
  • fDate
    26-28 April 2010
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    Copper pillar bumping is a promising solution to cope with the challenges which flip chip packages face when bump pitch size keep shrinking. A large FCBGA (flip chip ball grid array) package for 45 nm Cu/Low-K device with Cu pillar bumps is chosen to investigate the package reliability. Finite element models have been built with multi-level sub-modeling technique to consider the detailed Cu/Low-K structure in the chip. Comparison on Cu pillar bumps vs. solder bumps shows the former bump type generated about 20~30% higher stress on Cu/lowK structure. Thus package reliability may become a concern when Cu pillar is used. To improve the package reliability, design optimization is carried out on Cu pillar bump structure. DOE (design of experiment) study is done on the following factors: Cu pillar height, PI (polyimide) passivation opening and PI thickness etc. Loading is considered for both post flip chip attach process (reflow) and after full assembly (curing). It is found that the stress in post flip chip attach process is much higher than that after full assembly. For Cu/low-K devices, special care is needed for flip chip attach process. Stress on Cu/low-K interface has been analyzed in detail, and it is shown that the interface stress pattern is highly dependent on UBM structure design, especially PI opening and thickness. An overall picture of the PI effect is presented based on optimization results. Lower Cu pillar height, smaller PI opening and higher thickness are recommended for bump structure design.
  • Keywords
    copper; design of experiments; flip-chip devices; reliability; Cu; UBM structure design; bump structure design; copper pillar bump structure optimization; design of experiment study; design optimization; finite element models; flip chip ball grid array packaging; interface stress pattern; low-k device stack structure; multilevel submodeling technique; package reliability; polyimide passivation; post flip chip attach process; size 45 nm; solder bumps; Assembly; Copper; Design optimization; Electronics packaging; Finite element methods; Flip chip; Passivation; Polyimides; Stress; US Department of Energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE), 2010 11th International Conference on
  • Conference_Location
    Bordeaux
  • Print_ISBN
    978-1-4244-7026-6
  • Type

    conf

  • DOI
    10.1109/ESIME.2010.5464565
  • Filename
    5464565