DocumentCode :
2360296
Title :
Development of high aspect ratio via filling process for 3D packaging application
Author :
Praveen, Sampath Kumar ; Tsan, Ho Wai ; Chua, Kenneth ; Lam, Trang ; Nagarajan, Ranganathan
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear :
2010
fDate :
8-10 Dec. 2010
Firstpage :
762
Lastpage :
764
Abstract :
This paper presents our development work to achieve high aspect ratio void-free polymer via filling with various types of organic materials for potential application in 3D wafer level packaging. This study focuses on the development of via filling process using the conventional spin-coating and curing process. Thermoplastic polymers have been selected for this evaluation due to its ability to reflow and fill gaps easily. Test wafers with circular via patterns with diameters from 1-70 μm with aspect ratios from 1-10 have been evaluated. The various challenges to achieving void-free via filling have been presented and it has been demonstrated that a void-free filling is feasible for vias with aspect ratio of 1-8.
Keywords :
curing; filling; polymers; spin coating; wafer level packaging; 3D wafer level packaging; curing process; filling process; high aspect ratio void-free polymer; organic material; size 1 micron to 10 micron; size 1 micron to 70 micron; spin-coating; thermoplastic polymer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2010 12th
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-8560-4
Electronic_ISBN :
978-1-4244-8561-1
Type :
conf
DOI :
10.1109/EPTC.2010.5702749
Filename :
5702749
Link To Document :
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