DocumentCode :
236052
Title :
Reactive ion etching processes for Nb/NbxSi1−x/Nb Josephson junction arrays
Author :
Yuan Zhong ; Jinjin Li ; Wenhui Cao ; Yonggang Liu ; Qing Zhong ; Xueshen Wang
Author_Institution :
Nat. Inst. of Metrol., Beijing, China
fYear :
2014
fDate :
24-29 Aug. 2014
Firstpage :
118
Lastpage :
119
Abstract :
Reactive ion etching (RIE) is a common tool in micro- and nano-scale device fabrication. This paper presents experimental results of using the RIE tool to etch different films in Nb/NbxSi1-x/Nb Josephson junction array fabrication process in NIM.
Keywords :
measurement standards; microfabrication; nanofabrication; niobium; niobium compounds; sputter etching; superconducting arrays; superconducting junction devices; voltage measurement; Josephson junction array fabrication process; NIM; Nb-NbxSi1-x-Nb; PJVS; RIE tool; microscale device fabrication; nanoscale device fabrication; programmable Josephson voltage standards; reactive ion etching process; Etching; Fabrication; Films; Josephson junctions; Junctions; Niobium; Standards; ICP; Josephson junctions; RIE; dry etch;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
ISSN :
0589-1485
Print_ISBN :
978-1-4799-5205-2
Type :
conf
DOI :
10.1109/CPEM.2014.6898287
Filename :
6898287
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=236052
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