Accurate high-ohmic resistance measurement techniques up to 1 PΩ

Author

Rietveld, Gert ; Jarrett, Dean ; Jeckelmann, Beat

Author_Institution

VSL, Delft, Netherlands

fYear

2014

fDate

24-29 Aug. 2014

Firstpage

290

Lastpage

291

Abstract

An overview is presented on precision high-ohmic resistance measurements for values of 100 MΩ and above. The two main measurement techniques in this resistance range are discussed, the current integration technique and the adapted Wheatstone bridge. The quality of high-ohmic resistance standards, especially their time constants, temperature and voltage dependence, often is limiting the final uncertainty that can be reached. Still, expanded uncertainties (k = 2) of only a few parts in 10⁵ are achievable at the 1 TΩ level.

Keywords

electric resistance measurement; measurement standards; measurement uncertainty; adapted Wheatstone bridge; current integration technique; high-ohmic resistance measurement technique; high-ohmic resistance standard quality; measurement uncertainty; resistance 1 Tohm; Bridge circuits; Electrical resistance measurement; Resistance; Resistors; Standards; Temperature measurement; Voltage measurement; Resistance; adapted Wheatstone bridge; high-ohmic; precision measurement; resistance measurements; resistance scaling; teraohmmeter;

fLanguage

English

Publisher

ieee

Conference_Titel

Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on

Conference_Location

Rio de Janeiro

ISSN

0589-1485

Print_ISBN

978-1-4799-5205-2

Type

conf

DOI

10.1109/CPEM.2014.6898373

Filename

6898373