Title :
Measurement of nanoscale surface patterns produced by two-beam laser interference lithography
Author :
Pan, Haiyan ; Liu, Lanjiao ; Xu, Jia ; Xu, Hongmei ; Song, Zhengxun ; Weng, Zhankun ; Hu, Zhen ; Zhang, Jin ; Yue, Yong ; Li, Dayou ; Wang, Zuobin
Author_Institution :
CNM & IJRCNB Centers, Changchun Univ. of Sci. & Technol., Changchun, China
Abstract :
This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.
Keywords :
Hough transforms; edge detection; least squares approximations; light interferometry; lithography; measurement; micromechanical devices; production engineering computing; quality control; Hough fitting; fringe patterns; least-squares fitting; nanoscale surface pattern measurement; two-beam laser interference lithography; Fitting; Image edge detection; Noise; Noise measurement; Pixel; Speckle; Transforms;
Conference_Titel :
Mechatronics and Automation (ICMA), 2010 International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4244-5140-1
Electronic_ISBN :
2152-7431
DOI :
10.1109/ICMA.2010.5588724
