DocumentCode :
2364093
Title :
SiC power bipolar junction transistors - modeling and improvement of the current gain
Author :
Domeij, M. ; Lee, H.-S. ; Zetterling, C.-M. ; Ostling, M. ; Schoner, A.
Author_Institution :
Dept. of Microelectronics & Inf. Technol., KTH R. Inst. of Technol., Stockholm
fYear :
2005
fDate :
11-14 Sept. 2005
Abstract :
Epitaxial silicon carbide bipolar junction transistors (BJTs) for power switching applications have been designed and fabricated with a maximum breakdown voltage of 1100 V. The BJTs have high common emitter current gains with maximum values exceeding 60, a result that is attributed to design optimization of the base and emitter layers and to a high material quality obtained by a continuous epitaxial growth. Device simulations of the current gain as function of collector current have been compared with measurements. The measurements show a clear emitter-size effect that is in good agreement with simulations including surface recombination in interface states at the etched termination of the base-emitter junction. Simulations indicate an optimum emitter doping around 1middot10 cm19 in agreement with typical state-of-the-art BJTs
Keywords :
bipolar transistors; electric breakdown; silicon compounds; wide band gap semiconductors; 1100 V; SiC; base-emitter junction; breakdown voltage; collector current; design optimization; emitter current; emitter-size effect; epitaxial silicon carbide bipolar junction transistors; power switching applications; Current measurement; Doping; Epitaxial growth; Etching; Gain measurement; Interface states; MOSFETs; Neodymium; Silicon carbide; Substrates; Device characterization; Device modeling; Power semiconductor device; Silicon Carbide; Simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics and Applications, 2005 European Conference on
Conference_Location :
Dresden
Print_ISBN :
90-75815-09-3
Type :
conf
DOI :
10.1109/EPE.2005.219698
Filename :
1665888
Link To Document :
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