DocumentCode :
236474
Title :
Transportation effect of Ni-Cr based metal-foil standard resistors in a trilateral comparison pilot study between KRISS, NIST, and NMIJ
Author :
Kaneko, Nobu-hisa ; Oe, Takehiko ; Wan-Seop Kim ; Dong-Hun Chae ; Elmquist, Randolph ; Kraft, Michael
Author_Institution :
Nat. Metrol. Inst. of Japan, Nat. Inst. of Adv. Ind. Sci. & Technol, Tsukuba, Japan
fYear :
2014
fDate :
24-29 Aug. 2014
Firstpage :
546
Lastpage :
547
Abstract :
This paper describes a study on the transportation effect using four 100 Ω standard resistors of a new construction. All resistors have been transported by air: two of the resistors in hand-carried luggage and the other two by normal air freight. The standards have been measured by three national metrology institutes, the Korean Research Institute of Standards, the National Institute of Standards and Technology in USA and the National Metrology Institute of Japan by means of their primary national standards based on the quantum Hall effect. No noticeable difference between the two transportation methods has been detected within a standard uncertainty of 0.01 μΩ/Ω and performance suitable for international comparisons of this type of resistors has been demonstrated.
Keywords :
chromium; freight handling; measurement standards; measurement uncertainty; metallic thin films; nickel; quantum Hall effect; resistors; KRISS; Korean Research Institute of Standards; NIST; NMIJ; National Institute of Standards and Technology; National Metrology Institute of Japan; Ni-Cr; USA; hand carried luggage; metal foil standard resistor; normal air freight; primary national standards; quantum Hall effect; standard uncertainty; transportation effect; Electrical resistance measurement; NIST; Resistance; Resistors; Temperature measurement; Transportation; international comparison; quantum Hall effect; resistance standard; standard resistor; transportation effect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
ISSN :
0589-1485
Print_ISBN :
978-1-4799-5205-2
Type :
conf
DOI :
10.1109/CPEM.2014.6898501
Filename :
6898501
Link To Document :
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