DocumentCode
2364888
Title
A new technique for characterizing very low frequency noise of bipolar junction transistors
Author
Tuinhout, Hans ; Zegers-van Duijnhoven, Adrie ; Mertens, Hans ; Heringa, Anco
Author_Institution
Central R&D, NXP Semicond., Eindhoven, Netherlands
fYear
2011
fDate
9-11 Oct. 2011
Firstpage
170
Lastpage
173
Abstract
Using time sampled DC measurements from standard bench-top semiconductor parameter analyzers, it proves possible to characterize low frequency noise of BJT´s down to sub-mHz frequencies. The new technique is exemplified using SiGeC HBT´s. Base current random telegraph noise with time constants of as long as tens of seconds is demonstrated.
Keywords
1/f noise; Ge-Si alloys; bipolar transistors; random noise; semiconductor device noise; SiGeC; base current random telegraph noise; bench-top semiconductor parameter analyzers; bipolar junction transistors; time sampled DC measurements; very low frequency noise; Current measurement; Frequency measurement; Low-frequency noise; Noise measurement; Semiconductor device measurement; Time measurement; 1/f noise; Low-frequency noise; Silicon bipolar/BiCMOS process technology; device physics; measurement method;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2011 IEEE
Conference_Location
Atlanta, GA
ISSN
1088-9299
Print_ISBN
978-1-61284-165-6
Type
conf
DOI
10.1109/BCTM.2011.6082774
Filename
6082774
Link To Document